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National Repository of Grey Literature 2 records found  Search took 0.00 seconds. 
Mechanical and optical design of spectroscopic system for reactive ion etching system
 Šilhan, Lukáš ; Dostál, Zbyněk (referee) ; Šerý, Mojmír (advisor)
Measurement of absorption spectra of plasma during reactive ion etching enables characterization of etched species and control over the etching process. Aim of this diploma thesis is to design spectroscope with Czerny-Turner configuration for reactive ion etching system. Developed spectroscope achieves 1 nm resolution in 350-800 nm range. Device was tested during reactive ion etching of silicon.
Detailed record
Mechanical and optical design of spectroscopic system for reactive ion etching system
 Šilhan, Lukáš ; Dostál, Zbyněk (referee) ; Šerý, Mojmír (advisor)
Measurement of absorption spectra of plasma during reactive ion etching enables characterization of etched species and control over the etching process. Aim of this diploma thesis is to design spectroscope with Czerny-Turner configuration for reactive ion etching system. Developed spectroscope achieves 1 nm resolution in 350-800 nm range. Device was tested during reactive ion etching of silicon.
Detailed record

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